"An
Iron Rod Bends While It Is Hot" - Greek
Proverb
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The NETS Laboratory was founded by
Professor Peter E. Raad in 1995, using funds from NSF, SMU and
support from local industry.
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True to the vision of its founders, today's NETS
Laboratory continues to focus on the research and creative use of
thermal sciences to enhance the design and reliability of
microeletronics and explore new scientific frontiers.
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The
Submicron Electro-Thermal Sciences Laboratory (SETSL) was established
in 1995 in the School of Engineering and Applied Science(now School of
Engineering) at SMU in
recognition of the
local industry’s needs for noninvasive characterization of the thermal
properties of thin-film materials. The Laboratory features a
laser-based
transient thermoreflectance (TTR) measurement system, an electrical
performance
measurement system for microwave integrated circuits, and an adaptive
computational tool for rapid thermal modeling and an electro-thermal
analysis tool. For information on current research activities, please
see the Projects
section.
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The high rate of innovation in electronics and
telecommunications has raised expectations for higher performance
and
functionality. Most advances to date have evolved from smart
engineering and
efficient manufacturing practices. Equally substantial gains are also
possible
from the introduction of innovative materials. Indeed, miniaturization
and
performance requirements have forced the use of existing materials
beyond
initially envisioned ranges and have spurred the development of
specialty
materials. Example areas include, among others, high-performance
integrated
circuits (ICs), communication infrared detectors, and thermo-electric
cooling
systems.
Knowledge of material properties is fundamental
to the design process, especially for electronic and telecommunication
devices,
where performance depends heavily on electro-thermal interactions.
Higher
performance is only possible by significant reductions in the size of
active
features, which in turn can increase heat generation densities to
critical
levels. It is now widely held that bulk and thin-film thermal
properties differ
markedly. However, since no universal behavior is expected for these
differences and since they cannot be predicted from theory, the
properties of
each material must be measured separately. Also, as thin-film materials
are
normally layered, each interface contributes an additional resistance,
which is
unknown and must be measured in situ
since deposition techniques differ between manufacturers.
Research and development efforts at the NETSL
have yielded numerical techniques and experimental systems to thermally
analyze
and design ICs and devices. The experimental systems can noninvasively
measure
surface temperatures of active devices, as well as the thermal
properties of
the materials used, including dielectrics and semiconductors. A novel
self-adaptive numerical simulation method provides a unique capability
for the
thermal analysis and design of highly complex ICs. When used in
combination
with the experimental system, which can provide measurements of the
surface
(boundary) temperatures, the method provides an even more unique
capability for
determining the detailed internal temperatures of embedded (and thus
invisible)
features with any desired detail.
- For information on
current research activities, please see the Projects
section.
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